prov:value
| - The first insulating layer 30 may be comprised of a variety of materials, e.g., an oxide, an oxynitride, silicon dioxide, silicon oxynitride, HSQ, or other materials having a dielectric constant less than 5, and it may be formed by a variety of techniques, e.g., chemical vapor deposition (???CVD???), low pressure chemical vapor deposition (???LPCVD???), etc.
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