prov:value
| - The conductive layer of the upper electrode maybe formed, for example, of a metal such as copper (Cu), tantalum nitride (TaN), aluminum (Al), titanium (Ti), tantalum (Ta), titanium nitride (TiN), tantalum silicon nitride (TaSiN), titanium silicon nitride (TiSiN), tungsten nitride (WN) and/or tungsten silicon nitride (WSiN) using, for example, CVD, PVD and/or electroplating.
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