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  • Yet another object of the present invention is to provide device including a micromechanical resonator having a high-Q factor formed on a substrate wherein the device: a) is compatible with silicon-based planar IC technology; b) is reduced by orders of magnitude in size compared to SAW and quartz resonators; c) achieves high-Q in wide VHF range; d) has a yield-enhancing design; and (d) has good te
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