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  • Patent US7417104 - Porous film-forming composition, patterning process, and porous sacrificial film - Google PatentsSearch Images Maps Play YouTube News Gmail Drive More ??Sign inAdvanced Patent SearchPatentsA porous film-forming composition is provided comprising (A) a polymer obtained by hydrolytic condensation of a hydrolyzable silane having formula (1): R1 n???Si???R2 4-n (1) wherein R1 is a m
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