{ "items" : [
    { "id" : "http://webisa.webdatacommons.org/103223430"
      "properties" : {
        "http://www.w3.org/1999/02/22-rdf-syntax-ns#type" : [ "http://www.w3.org/ns/prov#Entity" ] ,
        "http://www.w3.org/ns/prov#value" : [ "MII is leveraging its innovative Jet and Flash??? Imprint Lithography (J-FIL???) technology to become the worldwide market and technology leader in high-volume patterning solutions for semiconductor memory devices, while enabling emerging markets in display, clean energy, biotechnology and other industries." ] ,
        "http://www.w3.org/ns/prov#wasQuotedFrom" : [ "nanowerk.com" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/63876335"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/103223430"] } } }
