{ "items" : [
    { "id" : "http://webisa.webdatacommons.org/107485631"
      "properties" : {
        "http://www.w3.org/1999/02/22-rdf-syntax-ns#type" : [ "http://www.w3.org/ns/prov#Entity" ] ,
        "http://www.w3.org/ns/prov#value" : [ "Moreover, thepreserved topography may be used for the original feature metrology such as, for example, the critical dimension (CD) measurement for line, space, contact hole, pillar, and other shapes widely used in semiconductor industry.While the invention has been described with reference to a preferred embodiment or embodiments, it will be understood by those skilled in the art that various chan" ] ,
        "http://www.w3.org/ns/prov#wasQuotedFrom" : [ "patentgenius.com" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/35388206"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/107485631" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/90379731"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/107485631" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/113057739"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/107485631" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/373242885"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/107485631"] } } }
