{ "items" : [
    { "id" : "http://webisa.webdatacommons.org/127606032"
      "properties" : {
        "http://www.w3.org/1999/02/22-rdf-syntax-ns#type" : [ "http://www.w3.org/ns/prov#Entity" ] ,
        "http://www.w3.org/ns/prov#value" : [ "Wafer processing chamber wall 342 provides a common ground for the system, and comprises a conductive material such as aluminum or the like." ] ,
        "http://www.w3.org/ns/prov#wasQuotedFrom" : [ "google.com" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/62320233"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/127606032" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/455181460"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/127606032"] } } }
