{ "items" : [
    { "id" : "http://webisa.webdatacommons.org/142097205"
      "properties" : {
        "http://www.w3.org/1999/02/22-rdf-syntax-ns#type" : [ "http://www.w3.org/ns/prov#Entity" ] ,
        "http://www.w3.org/ns/prov#value" : [ "Purging techniques such as these fail with tantalum systems because the residual tantalum precursor has such a low vapor pressure that to remove it a system must introduce a solvent, such as isopropyl alcohol, ethanol, hexane, or methanol, into both the vaporization system and supply lines." ] ,
        "http://www.w3.org/ns/prov#wasQuotedFrom" : [ "google.com" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/432311725"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/142097205" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/436748800"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/142097205"] } } }
