{ "items" : [
    { "id" : "http://webisa.webdatacommons.org/238019735"
      "properties" : {
        "http://www.w3.org/1999/02/22-rdf-syntax-ns#type" : [ "http://www.w3.org/ns/prov#Entity" ] ,
        "http://www.w3.org/ns/prov#value" : [ "Referring to FIG. 6A, the PECVD lining layer 300 is deposited in the reactor 10 by introducing an oxidizing gas such as N2O, an organosilane or organosiloxane compound such as CH3SiH3 or (CH3)2SiH2, and a carrier gas such as helium." ] ,
        "http://www.w3.org/ns/prov#wasQuotedFrom" : [ "google.com.au" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/280975537"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/238019735"] } } }
