{ "items" : [
    { "id" : "http://webisa.webdatacommons.org/309805844"
      "properties" : {
        "http://www.w3.org/1999/02/22-rdf-syntax-ns#type" : [ "http://www.w3.org/ns/prov#Entity" ] ,
        "http://www.w3.org/ns/prov#value" : [ "The photoresist composition containing a polymer having silicon atoms and sulfonium salt units as defined in claim 2, wherein each of said R2 and R3 is a radical selected from phenyl, methyl and ethyl groups." ] ,
        "http://www.w3.org/ns/prov#wasQuotedFrom" : [ "google.es" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/107271844"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/309805844" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/108625818"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/309805844"] } } }
