{ "items" : [
    { "id" : "http://webisa.webdatacommons.org/prov/454849375"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/363481214" ] } },

    { "id" : "http://webisa.webdatacommons.org/363481214"
      "properties" : {
        "http://www.w3.org/1999/02/22-rdf-syntax-ns#type" : [ "http://www.w3.org/ns/prov#Entity" ] ,
        "http://www.w3.org/ns/prov#value" : [ "Japanese Laid-Open Patent Publication No. 11-21546 discloses a second conventional polishing composition, which comprises an abrasive, an oxidant, a complexing agent, such as citric acid, and a film forming agent, such as imidazole." ] ,
        "http://www.w3.org/ns/prov#wasQuotedFrom" : [ "google.com" ] } },

    { "id" : "http://webisa.webdatacommons.org/prov/95488339"
      "properties" : {
        "http://www.w3.org/ns/prov#wasDerivedFrom" : [ "http://webisa.webdatacommons.org/363481214"] } } }
