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Another example is a process for forming a hafnium oxide (HfOx) film by supplying TDMAH (tetrakis(dimethylamino)hafnium: Hf[N(CH3)2]4) or TEMAH (tetrakis(ethylmethylamino)hafnium: Hf[N(CH3)(C2H5)]4) gas, and an oxidizing gas.
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