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isa:232943774
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The formation of optimized oxy-nitrides, carbo-borides, carbo-oxy-nitrides, silico-carbo-nitrides, oxy-fluorides, and the like may be accomplished by providing sputter gas mixtures that may contain N2, O2, N2O, BF3, C2F6, B2H6, CH4, SiH4, etc. either alone or in addition to an inert carrier gas, such as argon, and/or in addition to providing the elements from a sputter target.
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isap:324463263
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isa:232943774