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n4google.co.
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isa:246212923
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The method of claim 1, including the further steps of:placing on a conductive substrate another film on which a mirror image of the pattern is to be replicated; disposing the mask with its patterned side within electron tunneling distance of said other film; and replicating the pattern on said other film in a single step by applying a voltage between said mask and other film. 3.
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isa:246212923