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In order to solve this problem, a metal such as tungsten (W) is buried within the contact hole to form a plug, then a process of forming ametal layer is performed.Conventional method of forming a plug is described by reference to the FIGS. 1A through 1C.FIGS. 1A through 1C are cross-sectional views of device for explaining a conventional method of forming a plug in a semiconductor device.Referring
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