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nd metallization process optimized to maximize reflectanceUS62034073 Sep 199820 Mar 2001Micron Technology, Inc.Method and apparatus for increasing-chemical-polishing selectivityUS622177524 Sep 199824 Abr 2001International Business Machines Corp.Combined chemical mechanical polishing and reactive ion etching processUS622227330 Ene 199824 Abr 2001Micron Technology, Inc.System having vias including c
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