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hanical polishing (CMP) head having direct pneumatic wafer polishing pressureUS7381116Mar 30, 2006Jun 3, 2008Applied Materials, Inc.Polishing media stabilizerUS7494697May 11, 2006Feb 24, 2009San Fang Chemical Industry Co., Ltd.Substrate of artificial leather including ultrafine fibers and methods for making the sameUS7632378Mar 14, 2005Dec 15, 2009Ebara CorporationPolishing apparatusUS7762873May 1
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