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atmosphere composed of gasses such as argon (Ar) or nitrogen (N2), at a temperature between 300??? C. and 450??? C. for approximately 30 minutes. [0042] Furthermore, besides using the amorphous carbon film as a pattern mask for metal etch, as described above, the amorphous carbon film may also be used as a patterned hard mask for the etching of other films, including dielectric layers. [0043] Havi
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