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As such, other radical scavengers such as acetone, acetic acid, HPO4 2- (hydrogen phosphate ion) and salts thereof, H3 PO4, NH4 H2 PO4, (NH4)2 HPO4, salts of H2 PO4 -, of PO4 3-, and alkanes should also be effective for maintaining high photoresist removal rates, in particular when aluminum or other metal lines or structures are present on the substrate surface.
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