<http://webisa.webdatacommons.org/108864814>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/prov/57223320>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/108864814> .
<http://webisa.webdatacommons.org/prov/292907407>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/108864814> .
<http://webisa.webdatacommons.org/prov/411166145>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/108864814> .
<http://webisa.webdatacommons.org/108864814>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<uci.edu> .
<http://webisa.webdatacommons.org/108864814>	<http://www.w3.org/ns/prov#value>	"Advanced oxidation/reduction processes utilize a chemical such as ozone or hydrogen peroxide, and radiation or another source of energy, to form hydroxyl radicals as oxidizing agents and electrons as reducing agents." .