<http://webisa.webdatacommons.org/prov/108013098>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/139492199> .
<http://webisa.webdatacommons.org/139492199>	<http://www.w3.org/ns/prov#value>	"A process for forming a pattern which comprises(i) a step of coating a photoresist composition on a substrate, the photoresist composition comprising(a) a polymer having repeating units of the formula: ##STR36## wherein R1 is a hydrogen atom or a methyl group; R2 and R3 are independentl" .
<http://webisa.webdatacommons.org/prov/333262909>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/139492199> .
<http://webisa.webdatacommons.org/139492199>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com> .
<http://webisa.webdatacommons.org/139492199>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .