<http://webisa.webdatacommons.org/163312346>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com> .
<http://webisa.webdatacommons.org/163312346>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/prov/331586024>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/163312346> .
<http://webisa.webdatacommons.org/163312346>	<http://www.w3.org/ns/prov#value>	"In another preferred embodiment according to the present invention, the alignment control film 155 may be formed as a film of an inorganic insulating material such as SiO or SiO2 on the substrate 151B by the oblique or tilt vapor deposition." .