<http://webisa.webdatacommons.org/prov/455762477>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/166945577> .
<http://webisa.webdatacommons.org/166945577>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com> .
<http://webisa.webdatacommons.org/166945577>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/166945577>	<http://www.w3.org/ns/prov#value>	"Phase shift mask blanks are required to be resistant to chemicals such as acid and alkali solutions in order that the phase angle and the transmittance of the masks from them do not vary while they are indispensably washed with such solutions in the process of processing them into masks." .