<http://webisa.webdatacommons.org/177297607>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/177297607>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com.au> .
<http://webisa.webdatacommons.org/prov/334106573>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/177297607> .
<http://webisa.webdatacommons.org/177297607>	<http://www.w3.org/ns/prov#value>	"FIG. 4A is a plan view showing the structures of the first and second resist patterns 21 and 22 180 formed on the predetermined substrate 20 when the phase shift mask 1 is positioned at the exposure mask position Fm1." .