<http://webisa.webdatacommons.org/prov/185890453>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/179913567> .
<http://webisa.webdatacommons.org/179913567>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/179913567>	<http://www.w3.org/ns/prov#value>	"A semiconductor processing method in accordance with claim 8 wherein providing the substrate comprises providing a substrate including material having an average dopant concentration of at least 1???1016 ions/cm3." .
<http://webisa.webdatacommons.org/179913567>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com> .