<http://webisa.webdatacommons.org/189186282>	<http://www.w3.org/ns/prov#value>	"Pretreatment process 20 includes an annealing step 22 in which a substrate, such as a semiconductor substrate or a glass substrate, is annealed in a thermal anneal chamber and/or is annealed in a plasma anneal chamber." .
<http://webisa.webdatacommons.org/189186282>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com> .
<http://webisa.webdatacommons.org/189186282>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/prov/353356684>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/189186282> .