<http://webisa.webdatacommons.org/203753963>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/prov/397891953>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/203753963> .
<http://webisa.webdatacommons.org/203753963>	<http://www.w3.org/ns/prov#value>	"The present invention is related to the field of fabricating and testing semiconductor devices, and more particularly to methods and structures for E-beam testing of systematic and random defects during semiconductor device fabrication." .
<http://webisa.webdatacommons.org/prov/119970231>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/203753963> .
<http://webisa.webdatacommons.org/203753963>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com> .