<http://webisa.webdatacommons.org/prov/447138768>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/206285597> .
<http://webisa.webdatacommons.org/prov/448318246>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/206285597> .
<http://webisa.webdatacommons.org/206285597>	<http://www.w3.org/ns/prov#value>	"pad used in polishing micro-device workpiecesUS703325123 Ago 200425 Abr 2006Micron Technology, Inc.Carrier assemblies, polishing machines including carrier assemblies, and methods for polishing micro-device workpiecesUS703325312 Ago 200425 Abr 2006Micron Technology, Inc.Polishing pad conditioners having abrasives and brush elements, and associated systems and methodsUS70371799 May 20022 May 2006Mi" .
<http://webisa.webdatacommons.org/206285597>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.es> .
<http://webisa.webdatacommons.org/206285597>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .