<http://webisa.webdatacommons.org/206392250>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com> .
<http://webisa.webdatacommons.org/206392250>	<http://www.w3.org/ns/prov#value>	"06Applied MaterialsProcess control in electrochemically assisted planarizationUS7074114Jan 16, 2003Jul 11, 2006Micron Technology, Inc.Carrier assemblies, polishing machines including carrier assemblies, and methods for polishing micro-device workpiecesUS7112270Jun 6, 2003Sep 26, 2006Applied Materials, Inc.Algorithm for real-time process control of electro-polishingUS7115024 *Jan 5, 2005Oct 3, 2006" .
<http://webisa.webdatacommons.org/206392250>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/prov/448318246>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/206392250> .
<http://webisa.webdatacommons.org/prov/447138768>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/206392250> .