<http://webisa.webdatacommons.org/223686393>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<patentgenius.com> .
<http://webisa.webdatacommons.org/prov/350697742>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/223686393> .
<http://webisa.webdatacommons.org/223686393>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/223686393>	<http://www.w3.org/ns/prov#value>	"Remaining oxide 68 and 74 may then be removed using techniques well known in the art such as exposure to hydrofluoric acid.The presence of a native oxide on substrate 18 can affect the reproducibility of junction formation." .