<http://webisa.webdatacommons.org/prov/185256410>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/233453470> .
<http://webisa.webdatacommons.org/233453470>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/233453470>	<http://www.w3.org/ns/prov#value>	"Through the heat treatment, impurities such as hydrogen, moisture, a hydroxyl group, or hydride are intentionally removed from the oxide semiconductor film, whereby the oxide semiconductor film is highly purified." .
<http://webisa.webdatacommons.org/prov/61879023>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/233453470> .
<http://webisa.webdatacommons.org/233453470>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<faqs.org> .