<http://webisa.webdatacommons.org/241993299>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/241993299>	<http://www.w3.org/ns/prov#value>	"After exposure, the pattern is developed by dissolving the unexposed parts of the film in an organic solvent, for example ethyl acetate or methyl ethyl ketone." .
<http://webisa.webdatacommons.org/prov/429171401>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/241993299> .
<http://webisa.webdatacommons.org/prov/449456970>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/241993299> .
<http://webisa.webdatacommons.org/241993299>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com> .