<http://webisa.webdatacommons.org/25133317>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/25133317>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<sumitomo-chem.co.jp> .
<http://webisa.webdatacommons.org/25133317>	<http://www.w3.org/ns/prov#value>	"RCA cleaning is widely used to remove contaminants such as particles and metal impurities on a wafer in semiconductor manufacturing." .
<http://webisa.webdatacommons.org/prov/84069931>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/25133317> .
<http://webisa.webdatacommons.org/prov/84007600>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/25133317> .