. "FIG. 13A is a plan view showing the structures of the third and fourth resist patterns 23 185 and 24 185, and FIG. 13B is a sectional view showing the structures of the third and fourth resist patterns 23 185 and 24 185 taken along a line VIII???VIII??? shown in FIG. 13A. As in the case described with reference to FIG. 11A and FIG. 11B, at the time of exposure, the predetermined substrate 20 is su" . . .