<http://webisa.webdatacommons.org/265269148>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com> .
<http://webisa.webdatacommons.org/265269148>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/265269148>	<http://www.w3.org/ns/prov#value>	"Another embodiment of the present invention is a manufacturing method of an SOI substrate which is formed as follows: a glass substrate is processed with a solution including hydrochloric acid, sulfuric acid or nitric acid to form an altered layer on at least one surface of the glass substrate; a single crystal semiconductor substrate is bonded to the altered layer with a first insulating layer in" .
<http://webisa.webdatacommons.org/prov/455912810>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/265269148> .