<http://webisa.webdatacommons.org/267444770> <http://www.w3.org/1999/02/22-rdf-syntax-ns#type> <http://www.w3.org/ns/prov#Entity> . <http://webisa.webdatacommons.org/prov/57438858> <http://www.w3.org/ns/prov#wasDerivedFrom> <http://webisa.webdatacommons.org/267444770> . <http://webisa.webdatacommons.org/267444770> <http://www.w3.org/ns/prov#wasQuotedFrom> <google.com> . <http://webisa.webdatacommons.org/267444770> <http://www.w3.org/ns/prov#value> "ng said resist film after the pattern exposure wherein said based polymer is an ??-methylstyrene derivative: General Formula 9: General Formula 10: wherein R0 is an alkyl group; R1 is a group that is decomposed through irradiation of light; and R3 and R4 are the same or different and selected from the group consisting of hydrogen and compounds including hydrogen and carbon; at least one of R5 and" . <http://webisa.webdatacommons.org/prov/362980095> <http://www.w3.org/ns/prov#wasDerivedFrom> <http://webisa.webdatacommons.org/267444770> .