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<http://webisa.webdatacommons.org/267444770>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com> .
<http://webisa.webdatacommons.org/267444770>	<http://www.w3.org/ns/prov#value>	"ng said resist film after the pattern exposure wherein said based polymer is an ??-methylstyrene derivative: General Formula 9: General Formula 10: wherein R0 is an alkyl group; R1 is a group that is decomposed through irradiation of light; and R3 and R4 are the same or different and selected from the group consisting of hydrogen and compounds including hydrogen and carbon; at least one of R5 and" .
<http://webisa.webdatacommons.org/prov/362980095>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/267444770> .