<http://webisa.webdatacommons.org/284290963>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<spie.org> .
<http://webisa.webdatacommons.org/prov/163447629>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/284290963> .
<http://webisa.webdatacommons.org/284290963>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/284290963>	<http://www.w3.org/ns/prov#value>	"It was found that the diffusion of the photogenerated acid and bases is the most significant factor to determine resist sensitivity than others." .