<http://webisa.webdatacommons.org/304858162>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/304858162>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com> .
<http://webisa.webdatacommons.org/304858162>	<http://www.w3.org/ns/prov#value>	"The polishing system is particularly well-suited for planarizing or polishing a substrate that has undergone shallow trench isolation (STI) processing." .
<http://webisa.webdatacommons.org/prov/134308389>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/304858162> .