<http://webisa.webdatacommons.org/314428446>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com> .
<http://webisa.webdatacommons.org/314428446>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/314428446>	<http://www.w3.org/ns/prov#value>	"An insulating layer 101 is formed on a semiconductor substrate 100 by depositing insulating material such as silicon dioxide (SiO2) or borophosphosilicate glass (BPSG)." .
<http://webisa.webdatacommons.org/prov/457733979>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/314428446> .
<http://webisa.webdatacommons.org/prov/459109561>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/314428446> .