. . . "A conductive film 64 may then be deposited to a desired thickness to at least the sidewalls 46 and the floor 48 of the trench 50, The conductive film 64 may include a metal, such as a transition metal, or it may include other conductive materials, such as titanium nitride (TiN) and tantalum nitride (TaN), and various silicides, such as cobalt silicide (CoSi) and nickel silicide (NiSi)." .