<http://webisa.webdatacommons.org/367817048>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/367817048>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com> .
<http://webisa.webdatacommons.org/prov/353143976>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/367817048> .
<http://webisa.webdatacommons.org/367817048>	<http://www.w3.org/ns/prov#value>	"The invention relates particularly to the structure of such an electrode and its use in an apparatus for plasma etching and chemical vapor deposition, hereinafter referred to as PECVD." .