<http://webisa.webdatacommons.org/438305064>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/438305064>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.es> .
<http://webisa.webdatacommons.org/prov/337963166>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/438305064> .
<http://webisa.webdatacommons.org/prov/186508506>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/438305064> .
<http://webisa.webdatacommons.org/438305064>	<http://www.w3.org/ns/prov#value>	"In step 1, the positive photoresist is preferably deposited onto a spinning substrate, such as a gallium arsenide or silicon wafer." .