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<http://webisa.webdatacommons.org/49514694>	<http://www.w3.org/ns/prov#value>	"cess of the plasma processing apparatus.SUMMARY OF THE INVENTIONIt is an object of the present invention to provide a method for easily and rapidly evaluating whether a plasma processing apparatus or system is maintained at a required level of performance.Another object of the present invention is to provide a maintenance method for easily and rapidly correcting the plasma processing apparatus or" .