<http://webisa.webdatacommons.org/60519887>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/60519887>	<http://www.w3.org/ns/prov#value>	"The polishing composition of the present invention may further contain a pH-adjusting agent to adjust the pH, various surfactants and other additives, as the case requires." .
<http://webisa.webdatacommons.org/prov/284616956>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/60519887> .
<http://webisa.webdatacommons.org/60519887>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.com> .
<http://webisa.webdatacommons.org/prov/141675654>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/60519887> .