<http://webisa.webdatacommons.org/prov/62482538>	<http://www.w3.org/ns/prov#wasDerivedFrom>	<http://webisa.webdatacommons.org/9601182> .
<http://webisa.webdatacommons.org/9601182>	<http://www.w3.org/ns/prov#value>	"A method of manufacturing a semiconductor device according to claim 19, wherein a material including hydrogen is used as an ion source for the impurity ions used in the doping step." .
<http://webisa.webdatacommons.org/9601182>	<http://www.w3.org/1999/02/22-rdf-syntax-ns#type>	<http://www.w3.org/ns/prov#Entity> .
<http://webisa.webdatacommons.org/9601182>	<http://www.w3.org/ns/prov#wasQuotedFrom>	<google.co.uk> .