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| - Each of the insulating layers 108 and 110 can be formed to have a single layer structure or a stacked-layer structure, of a material such as silicon oxide, silicon nitride, silicon oxynitride, silicon nitride oxide, aluminum nitride, SiOF (silicon oxide containing fluorine), SiOC (silicon oxide containing carbon), DLC (Diamond-Like Carbon), porous silica, or the like.
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