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  • -OH, -CHO, or -COOHUS6524952Jun 20, 2000Feb 25, 2003Applied Materials, Inc.Method of forming a titanium silicide layer on a substrateUS6534361Aug 8, 2001Mar 18, 2003Samsung Electronics Co., Ltd.Method of manufacturing a semiconductor device including metal contact and capacitorUS6534395Mar 6, 2001Mar 18, 2003Asm Microchemistry OyMethod of forming graded thin films using alternating pulses of vapo
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