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An Entity of Type : prov:Entity, within Data Space : webisadb.webdatacommons.org associated with source dataset(s)

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  • Conventionally, in a lithographic process to manufacture devices such as semiconductors and liquid crystal displays, projection exposure apparatus has been used to project and transfer a pattern formed on a mask or a reticle (to be generically referred to as a ???reticle??? hereinafter) onto a substrate such as a wafer or a glass plate (to be suitably referred to as a ???substrate??? or a ???wafer
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