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  • otai Co., Ltd.Method of chemical vapor deposition and reactor thereforUS5788447Aug 5, 1996Aug 4, 1998Kokusai Electric Co., Ltd.Substrate processing apparatusUS5788799Jun 11, 1996Aug 4, 1998Applied Materials, Inc.Apparatus and method for cleaning of semiconductor process chamber surfacesUS5796116Jul 25, 1995Aug 18, 1998Sharp Kabushiki KaishaThin-film semiconductor device including a semiconductor f
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