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An Entity of Type : prov:Entity, within Data Space : webisadb.webdatacommons.org associated with source dataset(s)

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  • CorporationFlowing etchant source gas into plasma processing chamber, gas including fluorocarbon and nonreactive gases, providing radio frequency power wave form to electrode associated with plasma processing chamber, forming plasma, depositing polymerUS6110287 *Apr 28, 1997Aug 29, 2000Tokyo Electron LimitedPlasma processing method and plasma processing apparatusUS6129806 *Feb 28, 1997Oct 10, 2000
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